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Titre du Document
Remote plasma etching of titanium nitride using NF3/argon and chlorine mixtures for chamber clean applications
Auteur(s)
HELLRIEGEL Ronald ; ALBERT Matthias ; HINTZE Bernd ; ...
Résumé
To avoid plasma induced erosion of chamber hardware, the application of remote plasma sources to activate the etch gases was introduced. We present results on the etch behaviour of titanium nitride (TiN) using mixtures of NF3, Cl2 and argon. The gas mixture was excited in a remote plasma source and then routed through a reaction chamber to study the etch behaviour of TiN samples which simulate the situation at the chamber walls. The dependency of the TiN etch rate on temperature, gas flow, composition and pressure was examined. While the temperature (studied in the range 25-300 °C) turned out to be the most sensitive parameter, the general etch rate was mainly dependent on the availability of atomic fluorine. Etch products and NF3/Cl2 dissociation have been monitored by quadrupole mass spectrometry and infrared spectroscopy. While NF3 showed a high decomposition up to 96%, chlorine decomposition was not observed. However the addition of chlorine increased the etch rates up to 260% in the low pressure/low temperature regime. Surface effects of chlorine addition are indicated by X-Ray Photoelectron Spectrometry and REM surface analysis.
Editeur
Elsevier Science
Identifiant
ISSN : 0167-9317 CODEN : MIENEF
Source
Microelectronic engineering A. 2007, vol. 84, n° 1, pp. 37-41 [5 pages] [bibl. : 9 ref.]
Langue
Anglais
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